Mr. Yang-Chun Cheng Profile

Yang-Chun Cheng

at Univ of Wisconsin-Madison

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 29 September 2009 Paper

Tabletop soft x-ray lithography

M. Marconi, P. Wachulak, L. Urbanski, Artak Isoyan, Fan Jiang, Yang Chun Cheng, J. Rocca, C. Menoni, F. Cerrina

Proceedings Volume 7451, 74510J (2009) https://doi.org/10.1117/12.825509

KEYWORDS: Capillaries, Holography, Lithography, Photoresist materials, Printing, Nanostructures, Photomasks, Interferometry, X-ray lithography, Coherence imaging

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SPIE Journal Paper | 1 April 2009

Engineering study of extreme ultraviolet interferometric lithography

Jiang Fan, Yang-Chun Cheng, Artak Isoyan, Franco Cerrina

JM3, Vol. 8, Issue 02, 021203, (April 2009) https://doi.org/10.1117/12.10.1117/1.3112006

KEYWORDS: Modulation, Diffraction gratings, Photomasks, Diffraction, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Interferometry, Fringe analysis, Interferometers

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Proceedings Article | 18 March 2009 Paper

Extreme ultraviolet holographic lithography with a table-top laser

A. Isoyan, F. Jiang, Y.-C. Cheng, P. Wachulak, L. Urbanski, J. Rocca, C. Menoni, M. Marconi, F. Cerrina

Proceedings Volume 7271, 72713O (2009) https://doi.org/10.1117/12.814678

KEYWORDS: Computer generated holography, Extreme ultraviolet, Lithography, Photomasks, Holography, Photoresist materials, Extreme ultraviolet lithography, 3D image reconstruction, Image resolution, Nanolithography

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Proceedings Article | 16 March 2009 Paper

Patterning of SU-8 resist with digital micromirror device (DMD) maskless lithography

Tao Wang, Marzia Quaglio, Fabrizio Pirri, Yang-Chun Cheng, David Busacker, Franco Cerrina

Proceedings Volume 7274, 72742O (2009) https://doi.org/10.1117/12.814831

KEYWORDS: Glasses, Photomasks, Microfluidics, Maskless lithography, Ultraviolet radiation, Digital micromirror devices, Optical lithography, Semiconducting wafers, Lithography, Linear filtering

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Proceedings Article | 21 March 2008 Paper

Progress in extreme ultraviolet interferometric lithography at the University of Wisconsin

Artak Isoyan, Yang-Chun Cheng, Fan Jiang, John Wallace, Mikhail Efremov, Paul Nealey, Franco Cerrina

Proceedings Volume 6921, 69212R (2008) https://doi.org/10.1117/12.772681

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Modulation, Lithography, Diffraction gratings, Extreme ultraviolet, Chromium, Interferometry, Polymethylmethacrylate

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