Special Section on Alternative Lithographic Technologies V

Directed self-assembly compliant flow with immersion lithography: from material to design and patterning

[+] Author Affiliations
Yuansheng Ma, Junjiang Lei, Le Hong

Mentor Graphics Corporation, 46885 Bayside Parkway, Fremont, California 94538, United States

Yan Wang, Moshe Preil, Jongwook Kye, Harry J. Levinson

GLOBALFOUNDRIES, 2600 Great America Way, Santa Clara, California 95054, United States

James Word, Juan Andres Torres, Germain Fenger, Daman Khaira

Mentor Graphics Corporation, 8005 Southwest Boeckman Road, Wilsonville, Oregon 97070, United States

Joydeep Mitra

Mentor Graphics Corporation, 5000 Plaza on the Lake #310, Austin, Texas 78746, United States

J. Micro/Nanolith. MEMS MOEMS. 15(3), 031610 (Sep 29, 2016). doi:10.1117/1.JMM.15.3.031610
History: Received June 2, 2016; Accepted September 9, 2016
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Abstract.  We present a directed self-assembly (DSA) compliant flow for contact/via layers with immersion lithography assuming the graphoepitaxy process for the cylinders’ formation. We demonstrate that the DSA technology enablement needs co-optimization among material, design, and lithography. We show that the number of DSA grouping constructs is countable for the gridded-design architecture. We use template error enhancement factor to choose DSA material, determine grouping design rules, and select the optimum guiding patterns. Our post-pxOPC imaging data show that it is promising to achieve two-mask solution with DSA for the contact/via layer using 193i at 5 nm node.

© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Yuansheng Ma ; Yan Wang ; James Word ; Junjiang Lei ; Joydeep Mitra, et al.
"Directed self-assembly compliant flow with immersion lithography: from material to design and patterning", J. Micro/Nanolith. MEMS MOEMS. 15(3), 031610 (Sep 29, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.3.031610


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