Mr. Tsuyoshi Ogawa Profile

Tsuyoshi Ogawa

Research Engineering at Central Glass Co Ltd

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Author

Publications (4)

SPIE Journal Paper | 24 September 2013 Open Access

Reactive fluorinated surfactant for step and flash imprint lithography

Tsuyoshi Ogawa, Daniel Hellebusch, Michael Lin, B. Michael Jacobsson, William Bell, C. Grant Willson

JM3, Vol. 12, Issue 03, 031114, (September 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.031114

KEYWORDS: Lithography, Head-mounted displays, Glasses, Optical lithography, Microfluidics, Nanoimprint lithography, Interfaces, Natural surfaces, Chemistry, Failure analysis

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Proceedings Article | 4 April 2011 Paper

Reactive fluorinated surfactant for step and flash imprint lithography

Tsuyoshi Ogawa, Daniel Hellebusch, Michael Lin, B. Michael Jacobsson, William Bell, C. Grant Willson

Proceedings Volume 7970, 79700T (2011) https://doi.org/10.1117/12.871627

KEYWORDS: Fluorine, Silicon, Lithography, Head-mounted displays, Glasses, Optical lithography, Nanoimprint lithography, Interfaces, Information operations, Adhesives

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Proceedings Article | 3 April 2010 Paper

Planarizing material for reverse-tone step and flash imprint lithography

Tsuyoshi Ogawa, Satoshi Takei, B. Michael Jacobsson, Ryan Deschner, William Bell, Michael Lin, Yuji Hagiwara, Makoto Hanabata, C. Grant Willson

Proceedings Volume 7637, 763708 (2010) https://doi.org/10.1117/12.846430

KEYWORDS: Silicon, Ultraviolet radiation, Etching, Oxygen, Silicon carbide, Lithography, Scanning electron microscopy, Coating, Liquids, Epoxies

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Proceedings Article | 31 March 2010 Paper

Development of spin-on hard mask materials under resist in nano imprint lithography

Satoshi Takei, Tsuyoshi Ogawa, Ryan Deschner, Kane Jen, Makoto Hanabata, C. Willson

Proceedings Volume 7639, 76391C (2010) https://doi.org/10.1117/12.853200

KEYWORDS: Lithography, Photomasks, Ultraviolet radiation, Etching, Photoresist processing, Nanoimprint lithography, Electron beam lithography, Oxygen, Resistance, Silicon

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