Mr. Brandon Vollmer Profile

Brandon Vollmer

at Lawrence Berkeley National Lab

SPIE Involvement:

Author

Publications (3)

SPIE Journal Paper | 20 August 2024

Zone plate-based extreme ultraviolet mask microscope with through-pellicle imaging capability

Markus Benk, Dmytro Zaytsev, Chris Orman, Brandon Vollmer, Daniel Santos, Jeffrey Gamsby, Jeremy Mentz, Farhad Salmassi, Arnaud Allezy, Senajith Rekawa, Ryan Miyakawa, Weilun Chao, Eric Gullikson, Scott Chegwidden, Guojing Zhang, Patrick Naulleau, Bruno La Fontaine

JM3, Vol. 23, Issue 04, 041404, (August 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.041404

KEYWORDS: Microscopes, Extreme ultraviolet, Pellicles, Photomasks, Mirrors, Zone plates, Modulation, Imaging systems, Nanoimprint lithography, Microelectromechanical systems

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Proceedings Article | 23 March 2020 Presentation + Paper

How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive

Chris Anderson, Arnaud Allezy, Weilun Chao, Lucas Conley, Carl Cork, Will Cork, Rene Delano, Jason DePonte, Michael Dickinson, Geoff Gaines, Jeff Gamsby, Eric Gullikson, Gideon Jones, Lauren McQuade, Ryan Miyakawa, Patrick Naulleau, Seno Rekawa, Farhad Salmassi, Brandon Vollmer, Daniel Zehm, Wenhua Zhu

Proceedings Volume 11323, 113230B (2020) https://doi.org/10.1117/12.2552125

KEYWORDS: Mirrors, Scanners, Semiconducting wafers, Scanning electron microscopy, Camera shutters, Image processing, Vibration isolation, Projection systems

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Proceedings Article | 26 March 2019 Presentation + Paper

Overview and status of the 0.5NA EUV microfield exposure tool at Berkeley Lab

Christopher Anderson, Arnaud Allezy, Weilun Chao, Carl Cork, Will Cork, Rene Delano, Jason DePonte, Michael Dickinson, Geoff Gaines, Jeff Gamsby, Eric Gullikson, Gideon Jones, Stephen Meyers, Ryan Miyakawa, Patrick Naulleau, Senajith Rekawa, Farhad Salmassi, Brandon Vollmer, Daniel Zehm, Wenhua Zhu

Proceedings Volume 10957, 1095708 (2019) https://doi.org/10.1117/12.2516339

KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Optical lithography, Monochromatic aberrations, Line width roughness, Photoresist materials, Image processing, Projection systems

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