Mr. Jacob Dobson Profile

Jacob Dobson

at TEL Technology Ctr America LLC

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Publications (1)

Proceedings Article | 10 April 2024 Presentation

Breaching high-NA EUV dimensions with 193i anti-spacer multipatterning

Michael Murphy, Jacob Dobson, Jodi Grzeskowiak, David Power, Charlotte Cutler, Andrew Weloth, David Conklin

Proceedings Volume 12957, 1295711 (2024) https://doi.org/10.1117/12.3010447

KEYWORDS: Extreme ultraviolet, Printing, Lithography, Optical lithography, Integrated circuits, Film thickness, Extreme ultraviolet lithography, Etching, Double patterning technology, Chemistry

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