Special Section on EUV Sources for Lithography

High-radiance extreme-ultraviolet light source for actinic inspection and metrology

[+] Author Affiliations
Peter Choi, Sergey V. Zakharov, Otman Benali

NANO-UV SAS, 16–18 ave du Québec, SILIC 705, Villebon/Yvette 91140, France

EPPRA SAS, 16 ave du Québec, SILIC 706, Villebon/Yvette 91140, France

Raul Aliaga-Rossel, Aldrice Bakouboula, Philippe Bove, Michele Cau, Grainne Duffy, Osamu Iwase, Keith Powell

NANO-UV SAS, 16–18 ave du Québec, SILIC 705, Villebon/Yvette 91140, France

Blair Lebert, Ouassima Sarroukh, Clement Zaepffel, Vasily S. Zakharov

EPPRA SAS, 16 ave du Québec, SILIC 706, Villebon/Yvette 91140, France

J. Micro/Nanolith. MEMS MOEMS. 11(2), 021107 (Jun 07, 2012). doi:10.1117/1.JMM.11.2.021107
History: Received August 4, 2011; Revised December 13, 2011; Accepted December 22, 2011
Text Size: A A A

Abstract.  Actinic mask defect inspection and metrology requires high-brightness extreme-ultraviolet (EUV) sources. The self-absorption of radiation limits the in-band EUV radiance of the source plasma and makes it difficult to attain the necessary brightness and power from a conventional single unit EUV source. One possible solution is through multiplexing of multiple low etendue sources. NANO-UV is delivering a new generation of EUV light source, the CYCLOPS, in which a micro-plasma-pulsed discharge source is integrated to a photon collector based on an in situ active plasma structure. The source module is characterized by high brightness, low etendue, and high irradiance at moderate output power without the use of external physical optics. Such a source could form the basic building block of EUV source through spatial-temporal multiplexing of several units to deliver the brightness and power required for actinic mask metrology. We report on the EUV source development including the extensive numerical modeling, which provided the basic parameters required for high irradiance operating regimes. A new Sn-alloy cathode material enhances the output. Based upon the multiplexing concept, a family of specially configured multiplexed source structures, the HYDRA design, is being introduced to address the mask metrology needs.

Figures in this Article
© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Peter Choi ; Sergey V. Zakharov ; Raul Aliaga-Rossel ; Aldrice Bakouboula ; Otman Benali, et al.
"High-radiance extreme-ultraviolet light source for actinic inspection and metrology", J. Micro/Nanolith. MEMS MOEMS. 11(2), 021107 (Jun 07, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.2.021107


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

PubMed Articles
Advertisement


 

  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.